New “Atomic Vapor Deposition (AVD)” chamber installed
in IHP cleanroom
To bridge the gap from materials science to technology, an Aixtron Tricent AVD system is currently installed in the IHP cleanroom. “Atomic vapor deposition (AVD)” is the growth method of choice in industry for a number of important materials classes (advanced dielectrics, semiconductor films etc.). This is true because this method combines for example in a unique way the advantages of high and accurate mass flow with the ability to homogeneously cover highly scaled 3D structures. The compatibility of this machine with the IHP cleanroom facilities will speed up the difficult process of developing advanced materials systems for future Si-based technologies and integrate these new approaches into the process flow of integrated circuits. This “link” between materials research and technology will definitely raise the attractiveness of IHP for external customers interested in improving their technology by the integration of new materials. An important milestone in this respect is the strategic partnership recently signed by IHP and AIXTRON on a long-term R & D alliance on novel material development for integrated capacitors.
print version
23-04-08
Materials Science Lectures from IHP Materials Scientists online available
Materials Scientists from IHP-Microelectronics regularly embark during the academic year for teaching ... [more]
05-03-08
Advanced Silicon Materials Research for Electronic and Photovoltaic Applications
Strasbourg, France
May 25-31, 2008 [more]
24-09-07
DPG 2008 Spring Meeting. IHP Materials Scientists will organize a Symposium on high-k dielectrics in Silicon based Micro- and Nanoelectronics [more]
23-07-07
New BMBF “MEGAEPOS” project starts at IHP
IHP Materials Research Department under the guidance of Dr. Hans – Joachim Müssig is a partner in ... [more]
20-07-07
DFG funds new research projects at IHP
DFG recently approved the funding of new research projects in IHP Materials Research Department. ...[more]
22-11-06
PhD defense of Grzegorz Lupina at BTU Cottbus
After three years at the Materials Research department of IHP – Microelectronics in Frankfurt (Oder), our colleague ... [more]
22-11-06
New Molecular Beam Epitaxy (MBE) SiGe chamber fully functional at IHP materials research laboratory
“Molecular beam epitaxy (MBE)” is a very flexible, cost effective and accurate thin film deposition technique used ...[more]
07-06-06
Workshop on “Microelectronics meets Catalysis: Innovative Oxide Materials“.
Prof. M. Bäumer from the University of Bremen and Dr. Thomas Schroeder from IHP-Microelectronics in Frankfurt – Oder organize an Exploratory Workshop on Innovative Oxide Materials Systems nowadays of interest in catalytic as well as microelectronic applications. [more]
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