New “Atomic Vapor Deposition (AVD)” chamber installed
       in IHP cleanroom

To bridge the gap from materials science to technology, an Aixtron Tricent AVD system is currently installed in the IHP cleanroom. “Atomic vapor deposition (AVD)” is the growth method of choice in industry for a number of important materials classes (advanced dielectrics, semiconductor films etc.). This is true because this method combines for example in a unique way the advantages of high and accurate mass flow with the ability to homogeneously cover highly scaled 3D structures. The compatibility of this machine with the IHP cleanroom facilities will speed up the difficult process of developing advanced materials systems for future Si-based technologies and integrate these new approaches into the process flow of integrated circuits. This “link” between materials research and technology will definitely raise the attractiveness of IHP for external customers interested in improving their technology by the integration of new materials. An important milestone in this respect is the strategic partnership recently signed by IHP and AIXTRON on a long-term R & D alliance on novel material development for integrated capacitors.