Hanse-Wissenschaftskolleg Fellowship awarded to IHP
materials scientist
The Hanse Institute for Advanced Study (HWK) was founded in 1995. It is a non-profit private foundation of the German states of Lower Saxony and Bremen and the city of Delmenhorst. The main objective of the Institute consists in strengthening the regionally, nationally and internationally recognized research potential of the universities and research institutions in the area, in particular the University of Bremen (www.uni-bremen.de) and the University of Oldenburg (www.uni-oldenburg.de). In this respect, the HWK promotes excellence in research by awarding fellowships to especially qualified scientists with the aim to initiate and promote long-term collaborations between their home institutes and the Universities of Bremen and Oldenburg.
Recently, the HWK awarded a fellowship to the IHP materials scientist Dr. Thomas Schroeder. It acknowledges in this way the scientific work of the IHP Materials Research Department on thin dielectric films on silicon (Si) in general and the contribution of Dr. Thomas Schroeder on heteroepitaxial rare earth oxide / Si systems in particular. The fellowship in 2006 will focus on a project named “Rare Earth oxide ultra-thin films on Si: Microelectronics meets Catalysis” to set the basis for a fruitful exchange of ideas and concepts between researchers from the two different fields.
More information is available on: www.h-w-k.de
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