New BMBF “MEGAEPOS” project starts at IHP

IHP Materials Research Department under the guidance of Dr. Hans – Joachim Müssig is a partner in the recently approved BMBf “MEGAEPOS” project, focussing on the development of engineered dielectric layers for future CMOS and highly scaled DRAM applications in Si based Nanoelectronics. IHP will concentrate its research activities in close collaboration with its industrial partner Qimonda on the DRAM part of the project, using its state – of the art thin film deposition techniques (MBE plus AVD) as well as its modern materials science and dielectric characterization methods. More information on dielectric layers for future DRAM devices is available by using the following link:

http://www.ihp-ffo.de/93.0.html