IHP - Innovations for High Performance Microelectronics: DPG 2008 Spring Meeting

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DPG 2008 Spring Meeting

During the DPG Solid State Physics Spring Meeting from 25^th – 29^th February 2008 in Berlin (Germany), the IHP Materials Research Scientists Dr. T. Schroeder and Dr. H.-J. Müssig have the pleasure to follow the invitation of Prof. M. Imlau from the University of Osnabrück (speaker of the DPG section “Dielectric Solid Matter Physics”) to organize a Symposium focussing on industrial applications as well as current materials research topics in the area of high-k dielectrics for highly scaled Silicon – based Micro- & Nanoelectronics.

The DPG „High-K Symposium“ is scheduled to take place the 25^th February 2008 between 2-5 p.m. The location will be at the Technical University of Berlin (Room EB 107). The following colleagues were recently contacted by the organizers to give an invited presentation of the work of their group in the various fields. Please consult the web page for future changes.

Time + Title

CMOS - Session

Industrial Applications:

2.00 - 2.40 p.m.

High-k gate dielectrics on silicon and on

high-mobility semiconductors: Atomic-

scale phenomena underlying transistor

Martin Frank (confirmed)

IBM, Thomas J. Watson Research Center,

Yorktown Heights, New York

(USA)

Current Research Issues:

2.40 - 3.05 p.m.

High-k oxides grown on Si by MBE for

CMOS applications :

structural and electrical properties

Guillaume Saint Girons (confirmed)

École Centrale de Lyon, LEOM, Lyon

(France)

Current Research Issues:

3.05 - 3.30 p.m.

Damascene Metal Gate Technology: A

Solution to High-K Gate Stack Challenges

Udo Schwalke (confirmed)

TU Darmstadt, Institute of Semiconductor

Physics & Nano-Electronics, Darmstadt

(Germany)

DRAM - Session

Industrial Applications:

3.30 - 4.10 p.m.

Do new materials solve the upcoming

challenges of future

DRAM memory cells ?

Uwe Schroeder (confirmed)

Qimonda, Technology Innovations, Dresden,

(Germany)

Current Research Issues:

4.10 - 4.35 p.m.

AVD and ALD developments for next

generation MIM capacitors and memory

Michael Heuken (confirmed)

Aixtron AG, Aachen (Germany)

Current Research Issues:

4.35 - 5.00 p.m.

MIM capacitors for wireless

communication technologies

Christian Wenger (confirmed)

IHP Microelectronics, Frankfurt-Oder,

(Germany)

print version

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