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   Technology Department

 


IHP’s Technology Department is focused on the development of technologies with high performance for very high frequencies, low cost technologies for system-on-chip applications, and running these technologies in the pilot line for IHP’s projects and for the worldwide MPW & Prototyping Service.

 

The development is based on a “value added approach” in which “value” is added to standard CMOS technologies by modular extension (SiGe:C HBT’s, LDMOS transistors, embedded flash memories, passives…)

 

Main research topics are currently related to the development of a 0.13 µm SiGe BiCMOS technology in addition to the existing 0.25 µm technologies. This involves considerable efforts in upgrading the equipment and developing the technological steps.

 

Concepts for HBTs and integrated LDMOS for the 0.13 µm technology level are being worked out. Considerable attention is being paid to the further extension of the HBT’s performance limits and the integration of complementary high-performance HBTs. Additional technology modules such as flash memory are being developed for integration. High-Q passives, varycaps, schottky diodes and high-capacitance MIMs based on new high-K materials are under investigation.

 

Considerable efforts are being made to further qualify and extend IHP’s running 0.25 µm technology services via MPW and Prototyping.

 

Technological competence goes back a long way at the IHP. About half of the institute’s staff is engaged with technology including the 24/7 clean room operation.

 




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15-04-08
European Consortium to push the speed limit of silicon based transistor up to 0.5 TeraHertz[more]


25-03-08
7th Meeting of GMM Competence Group
“Process control, Inspection and Analytics”

IHP has organized on 06.03.2008 the ... [more]


16-11-07
IEEE International Electron Devices Meeting (IEDM 2007)
Washington, DC
December 10-12, 2007 [more]


04-09-07
6th Workshop
High-Performance SiGe BiCMOS (September 10, 2007) and Tutorial IHP Design Kits (September 11-12, 2007)

[more]


30-08-07
Long Term Research Cooperation Between Taiwanese National Nano Device Laboratories and IHP
Frankfurt (Oder)/Hsinchu, August 24th, 2007: Today the National Nano Device Laboratories located in ... [more]