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   Materials for Micro- and Nanoelectronics - Selected projects

 


More information on specific research topics in the “Dielectrics for future Si-based nanoelectronic device technologies” project of the IHP Materials Research department is included below:

 

 


Involved Department:      Materials Research

 

 

CMOS. High-k gate dielectrics for future CMOS device technologies.   more

 

DRAM. High-k dielectrics for future DRAM cell technologies.   more

 

Passives MIM. High-k dielectric for future MIM capacitors in mixed signal ICs.   more

 

Heteroepitaxy. Integration of functional semiconductor layers on the Si technology platform.   more

 

Theory. Ab initio investigation of dielectrics for modern microelectronics.   more

 

NVM. Resistive Switching Dielectrics for non-volatile memory (NVM) applications.   more

 

SAW. Integrated Surface Acoustic Wave (SAW) Devices.   more




print version



23-04-08
Materials Science Lectures from IHP Materials Scientists online available
Materials Scientists from IHP-Microelectronics regularly embark during the academic year for teaching ... [more]


05-03-08
Advanced Silicon Materials Research for Electronic and Photovoltaic Applications
Strasbourg, France
May 25-31, 2008 [more]


24-09-07
DPG 2008 Spring Meeting. IHP Materials Scientists will organize a Symposium on high-k dielectrics in Silicon based Micro- and Nanoelectronics [more]


23-07-07
New BMBF “MEGAEPOS” project starts at IHP
IHP Materials Research Department under the guidance of Dr. Hans – Joachim Müssig is a partner in ... [more]


20-07-07
DFG funds new research projects at IHP
DFG recently approved the funding of new research projects in IHP Materials Research Department. ...[more]


22-11-06
PhD defense of Grzegorz Lupina at BTU Cottbus
After three years at the Materials Research department of IHP – Microelectronics in Frankfurt (Oder), our colleague ... [more]


22-11-06
New Molecular Beam Epitaxy (MBE) SiGe chamber fully functional at IHP materials research laboratory
“Molecular beam epitaxy (MBE)” is a very flexible, cost effective and accurate thin film deposition technique used ...[more]


07-06-06
Workshop on “Microelectronics meets Catalysis: Innovative Oxide Materials“.
Prof. M. Bäumer from the University of Bremen and Dr. Thomas Schroeder from IHP-Microelectronics in Frankfurt – Oder organize an Exploratory Workshop on Innovative Oxide Materials Systems nowadays of interest in catalytic as well as microelectronic applications. [more]


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