Materials for Micro- and Nanoelectronics - Selected projects

More information on specific research topics in the “Dielectrics for future Si-based nanoelectronic device technologies” project of the IHP Materials Research department is included below:

Involved Department:      Materials Research

CMOS. High-k gate dielectrics for future CMOS device technologies.   more

DRAM. High-k dielectrics for future DRAM cell technologies.   more

Passives MIM. High-k dielectric for future MIM capacitors in mixed signal ICs.   more

Heteroepitaxy. Integration of functional semiconductor layers on the Si technology platform.   more

Theory. Ab initio investigation of dielectrics for modern microelectronics.   more

NVM. Resistive Switching Dielectrics for non-volatile memory (NVM) applications.   more

SAW. Integrated Surface Acoustic Wave (SAW) Devices.   more