References
[1] Rainer Waser, Nanoelectronics and Information Technology – Advanced Electronic Materials and Novel Devices 2nd Edition, Wiley VCH, 2005.
[2] Takashi Hori, Gate Dielectrics and MOS ULSI – Principles, Technologies and Applications, Springer Series in Electronics and Photonics Volume 34,
edited by I.P. Kaminow, W. Engl and T. Sugano, 1996.
[3] J.F. Scott, Ferroelectric Memories, Springer Series in Advanced Microelectronics Vol. 3, 2000.
[4] J.M. Slaughter, R.W. Dave, M. DeHerrera, M. Durlam, B.N. Engel, J. Janesky, N.D. Rizzo and S. Tehrani, Journal of Superconductivity: Incorporating
Novel Magnetism, Vol.15, No.1, February 2002.
[5] Relva C. Buchanan, Ceramic Materials for Electronics, Marcel Dekker, 2004.
[6] H.R. Huff and D.C. Gilmer, High Dielectric Constant Materials – VLSI MOSFET Applications, Springer Series in Advanced Microelectronics Vol. 16,
2005.
[7] J. Amon, A. Kieslich, T. Schuster, J. Faul, J. Luetzen, C. Fan, C.-C. Huang, B. Fischer, G. Enders,S. Kudelka, U. Schroeder, K.-H. Kuesters, G. Lange,
and J. Alsmeier, Tech. Dig. Int. Electron Devices Meet., 2004.

