IHP microelectronics

Workshop Scientific Program

Thursday, July 20, 2006

Welcome

9:30 – 9:45 Marcus Bäumer (Universität Bremen)
Short introduction into the physics and chemistry of oxide films and their interaction with various materials seen from a “catalytic” point of view.
Talk

9:45 – 10:00 Thomas Schröder (IHP - Microelectronics)
On the role of dielectrics in Si-based micro- and nanoelectronics
Abtract, Talk

Modern preparation techniques
(Preparation methods for research (model systems etc.) and technology
(process compatibility etc.))

10:15 - 11:00 Catalysis
E. Kemnitz (HU Berlin)
A new sol-gel-synthesis approach towards VO_x -doped metal fluorides as potential selective oxidation catalysts
Talk

11:15 - 12:00 Microelectronics
Ch. Wenger (IHP - Microelectronics)
Advanced dielectric thin film deposition techniques in microelectronics:
From research to production
Abtract, Talk

12:00 - 14:15 Lunch

Advanced materials science characterization techniques
(Characterization methods for materials science/catalysis as well as technological studies)

14:15 - 15:00 Modern X-ray diffraction techniques
Tien-Lin Lee (ESRF Grenoble)
In-situ x-ray diffraction studies of surfaces and interfaces using synchrotron radiation
Abtract, Talk

15:15 – 16:00 Modern Photoemission Techniques
Dieter Schmeisser (BTU Cottbus; Bessy II)
XAS and resonant PES at the O1s threshold to characterize oxidic thin films for microelectronic applications
Talk

16:00 – 16:45 Coffee Break

Transport Properties
(Oxide transport properties for catalytic behavior, dielectric properties, J-V measurements etc.)

16:45 - 17:30 Catalysis
M. Schroeder (RWTH Aachen)
Defect chemistry and transport properties of ‘Simple’ and ‘complex’ oxide functional materials
Abstract

17:45 – 18:30 Microelectronics
Martin M. Frank, IBM T. J. Watson Research Center,
Yorktown Heights, NY, USA
Ultrathin dielectric oxides for microelectronics: Electrical characteristics and defects
Abstract, Comment

18:30 Conference Dinner

Friday, July, 21, 2006

Theoretical description
(Examples of the role of defects, interfaces etc.)

9:00 - 9:45 Catalysis
G. Pacchioni (Universität Mailand Bicocca)
The unusual chemical properties of Au atoms and clusters
deposited on ultra-thin oxide films
Abstract, Talk

10:00 – 10:45 Microelectronics
P. Blöchl (Uni Clausthal)
First-principles calculations on the formation of epitaxial semiconductor oxide interfaces for future transistor generations
Abstract

10:45 – 11:15 Coffee Break

Applications
(Problems in research and applications)

11:15 - 12:00 Catalysis
F. Jentoft (FHI Berlin)
Zirconium Oxide - a Variable Catalyst Component
Abstract, Talk

12:15 – 13:00 Microelectronics
G. Scarel (MDM - INFM Agrate Brianza)
Rare earth oxides by atomic layer deposition on Si and Ge: evaluation and perspectives
Abstract

13:00 Lunch
Departure

Thursday, July 20, 2006
	Welcome
9:30 – 9:45	Marcus Bäumer (Universität Bremen) Short introduction into the physics and chemistry of oxide films and their interaction with various materials seen from a “catalytic” point of view. Talk
9:45 – 10:00	Thomas Schröder (IHP - Microelectronics) On the role of dielectrics in Si-based micro- and nanoelectronics Abtract, Talk
	Modern preparation techniques (Preparation methods for research (model systems etc.) and technology (process compatibility etc.))
10:15 - 11:00	Catalysis E. Kemnitz (HU Berlin) A new sol-gel-synthesis approach towards VO_x -doped metal fluorides as potential selective oxidation catalysts Talk
11:15 - 12:00	Microelectronics Ch. Wenger (IHP - Microelectronics) Advanced dielectric thin film deposition techniques in microelectronics: From research to production Abtract, Talk
12:00 - 14:15	Lunch
	Advanced materials science characterization techniques (Characterization methods for materials science/catalysis as well as technological studies)
14:15 - 15:00	Modern X-ray diffraction techniques Tien-Lin Lee (ESRF Grenoble) In-situ x-ray diffraction studies of surfaces and interfaces using synchrotron radiation Abtract, Talk
15:15 – 16:00	Modern Photoemission Techniques Dieter Schmeisser (BTU Cottbus; Bessy II) XAS and resonant PES at the O1s threshold to characterize oxidic thin films for microelectronic applications Talk
16:00 – 16:45	Coffee Break
	Transport Properties (Oxide transport properties for catalytic behavior, dielectric properties, J-V measurements etc.)
16:45 - 17:30	Catalysis M. Schroeder (RWTH Aachen) Defect chemistry and transport properties of ‘Simple’ and ‘complex’ oxide functional materials Abstract
17:45 – 18:30	Microelectronics Martin M. Frank, IBM T. J. Watson Research Center, Yorktown Heights, NY, USA Ultrathin dielectric oxides for microelectronics: Electrical characteristics and defects Abstract, Comment
18:30	Conference Dinner
Friday, July, 21, 2006
	Theoretical description (Examples of the role of defects, interfaces etc.)
9:00 - 9:45	Catalysis G. Pacchioni (Universität Mailand Bicocca) The unusual chemical properties of Au atoms and clusters deposited on ultra-thin oxide films Abstract, Talk
10:00 – 10:45	Microelectronics P. Blöchl (Uni Clausthal) First-principles calculations on the formation of epitaxial semiconductor oxide interfaces for future transistor generations Abstract
10:45 – 11:15	Coffee Break
	Applications (Problems in research and applications)
11:15 - 12:00	Catalysis F. Jentoft (FHI Berlin) Zirconium Oxide - a Variable Catalyst Component Abstract, Talk
12:15 – 13:00	Microelectronics G. Scarel (MDM - INFM Agrate Brianza) Rare earth oxides by atomic layer deposition on Si and Ge: evaluation and perspectives Abstract
13:00	Lunch Departure