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CMOS

[1] I.M. Ross, Bell Labs Technical Journal, Autumn, 3 (1977).

[2] Y. Taur IBM J. Res. & Dev. 46, 2002, 213

[3] B. Doyle, R. Arghavani, D. Barrage, S. Datta, M. Doczy, J. Kavalieros, A. Murthy, R. Chau, Intel Technology Journal 6, 42 (2002).

[4] H. R. Huff, D. C. Gilmer High Dielectric Constant Materials, Springer-Berlin, 2005

[5] Rainer Waser, Nanoelectronics and Information Technology – Advanced Electronic Materials and Novel Devices 2nd Edition, Wiley VCH, 2005.

[6] Takashi Hori, Gate Dielectrics and MOS ULSI – Principles, Technologies and Applications, Springer Series in Electronics and Photonics Volume 34, edited by I.P. Kaminow, W. Engl and T. Sugano, 1996.

[7] A.K. Jonscher, Dielectric Relaxation in Solids, Chelsea Dielectric Press, London, 1983

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