Material analysis and Metrology group supports research activities at IHP by a broad portfolio of analytical tools and techniques. Our analytical capabilities are employed in the following areas:
- Visualization of surface and cross-section morphology of IC's
- Contamination analysis of Si-Wafer (quantification and mapping)
- Depth profile analysis of dopants (quantification and profile shape)
- Thickness and stoichiometry measurements of thin films
- Strain and crystallinity analysis of epitaxial layer
- Surface analysis of organic contaminants
- Failure analysis of IC's
- Circuit modification
