MPW Schedule 2026 & 2027 and Price Information 2026

General Technology Description

IHP offers standard 0.13 and 0.25 μm CMOS processes which provide NMOS, PMOS, isolated NMOS and passive components such as poly resistors and MIM capacitors. In addition to the standard CMOS processes different front-end-of-line options are offered. In 0.25 μm CMOS the standard aluminum BEOL backend offers 3 thin metal layers and two TopMetal layers (TopMetal1 - fourth 2 μm thick metal layer, TopMetal2 – fifth 3 μm thick metal layer). The Al-BEOL backend for 0.13 μm process offers 5 thin and 2 thick metal layers (TM1: 2 μm TM2: 3 μm). Together with a high dielectric stack this enables increased performance of the passive RF components.

Technologies with an enhanced copper BEOL option are offered.

Technologies for MPW & Prototyping

SG13SA high-performance 0.13 µm BiCMOS with npn-HBTs up to fT / fmax= 250/340 GHz, with 3.3 V I/O CMOS and 1.2 V logic CMOS.
SG13G2A 0.13 µm BiCMOS technology with much higher bipolar performance of fT/fmax = 350/450 GHz.
SG13CMOS‍A RF CMOS technology which includes all features of SG13G2, but no bipolar HBTs
SG13CMOS5LA CMOS technology offered for open-source education designs and which includes front-end of SG13CMOS, but noisolated NMOS, further only 4 thin metal layer and one 2μm thick TopMetal and no MIM capacitor
SG13SCuFEOL process SG13S together with 8 layer Cu BEOL option from X-FAB containing 4 thin Cu layers, 2 thick 3 µm Cu layers, a thin Al layer with 2 fF/µm MIM capacitor and a 2.8 µm Al top layer.
SG13G2CuFEOL process SG13G2 together with 8 layer Cu BEOL option from X-FAB containing 4 thin Cu layers, 2 thick 3 µm Cu layers, a thin Al layer with 2 fF/µm MIM capacitor and a 2.8 µm Al top layer.
SG13G3CuIHP´s highest performance HBT’s with ft/fmax = 470/650 GHz. The process offers a 8-layer Cu-BEOL from X-FAB containing 4 thin Cu layers, 2 thick 3μm Cu layers, a thin Al layer with 2 fF/μm MIM capacitor and a 2.8 μm Aluminum top layer. This technology offers CMOS devices with 130 nm gate length and 1.2 V core voltage and high voltage CMOS devices with 3.3 V core voltage.
SG25H7_EPICA monolithic photonic BiCMOS technology combining 0.25 µm CMOS, high-performance npn HBTs (fT / fmax = >350/>500 GHz), and full photonic device set for C/O-band.
SGB25RHIs a special variant of SGB25V which includes radiation hard IP for space applications.
INTM4TM2 ‍Interposer technology which offers 2 thin and 2 thick Al-BEOL layer on a high resistivity substrate. Further is contains a MIM capacitor and a Thin film resistor. 

A cadence-based mixed signal design kit is available. For high frequency designs an analogue Design Kit in ADS can be used. IHP's reusable blocks and IPs for wireless and broadband are offered to support your designs. 

The following Modules are available

LBEThe Localized Backside Etching module is offered to remove silicon locally to improve passive properties (available in all Al-BEOL technologies).
H7PICIncludes additional photonic design layers along with BiCMOS BEOL layers on SOI wafers.
TSVAn additional option in SG13S and SG13G2 technology that provides RF grounding by vias through silicon to improve RF performance.
MEMRES (RRAM)An RRAM based fully CMOS integrated memristive module based on resistive TiN / HfO2-x / TiN switching devices in SG13G2 technology, along with a Process Design Kit including layout and VerilogA simulation model.

 

2.1 MPW Price Information 2026

Non-Commercial Access

For European non-profit and educational institutions, special discounts are offered for research projects via EUROPRACTICE

2.1.1 Prices for Technologies 

Process     Area Price / mm2
SGB25RH€ 3050
SG25H7_EPIC€ 9000
SG13S€ 6300
SG13C€ 4500
SG13G2€ 7300
SG13G3€ 9000
SG13SCu€ 6300
SG13G2Cu€ 7300
SG13G3Cu€ 9000

 

2.1.2 Prices for Modules

Module (Process)Price
LBE (all Al BEOL)€ 5000 per order and technology
BEOL (only) 0.13 µm (SG13)€ 1300 (per mm2)
SG25_H7PIC€ 3800 (per mm2)
TSV (S, G2)€ 12500 per order
MEMRES (G2)€ 2500 per Run + € 600 per mm2
INTM4TM2€ 900 (per mm²)

2.2 MPW Schedule

There is a minimum area requirement of only 0.8 mm2 for all runs with bold shipment times. For all technologies or modules marked in brackets, minimum area order is required. For details see chapter 2.4. TAPE IN time is given in a column “TAPE IN”, shipment time in corresponding table cells.

Schedule for complete technologies

2026

TAPE INSG25SG13
 EPIC H7CMOS & CMOS5L**SMEMRESSCuG2CuG2G3G3Cu
Nov 3, 25Jul
13
        
Nov 24, 25 May
18*
       
Dec 8, 25  Sep
21*
Oct
08*
Aug
13*
Jun
29
Jun
10
Jul
26
Jul
09
Mar 16, 26     Sep
07
  Sep
17
Mar 30, 26 Oct
02*
       
Jun 1, 26  Mar
15*
Feb
04*
  Dec
16
  
Jul 13, 26 Dec
16*
       
Aug 31, 26  May
18*
 May
10*
Mar
05
Apr
12
Apr
19
Mar
04
Oct 6, 26      Jun
30**
  
Nov 2, 26Jul
05
        
Nov 16, 26 May
10*
       
Dec 7, 26  Sep
20*
Jul
02*
Aug
12*
Jun
28
Jun
16
Jun
22
Jul
08

* Runs with lower priority
** Open-Source MPW Runs with special conditions, which you can find here

2027

Changes for 2027 schedule are possible till December 1st 2026.

TAPE INSG25SG13
 EPIC H7CMOS5L**SMEMRESSCuG2CuG2G3G3Cu
Nov 2, 26Jul
05
        
Nov 16, 26 May
10*
       
Dec 7, 26  Sep
20*
Jul
02*
Aug
12*
Jun
28
Jun
16
Jun
22
Jul
08
Mar 15, 27     Sep
06
   
Mar 30, 27 Sep
16*
       
May 31, 27  Mar
13*
Feb
03*
  Dec
15
  
Aug 30, 27  May
15*
 May
04*
Feb
21
Apr
10
Apr
18
Mar
02
Oct 4, 27      Jun
25**
  
Nov 1, 27Jul
03
        
Nov 15, 27 May
08*
       
Dec 6, 27  Sep
18*
Jun
30*
Aug
10*
Jun
26
Jun
14
Jun
20
Jul
06

* Runs with lower priority
** Open-Source MPW Runs with special conditions, which you can find here

Local Backside Etching (LBE) is not offered for runs with Cu-BEOL from X-FAB. For all the other runs LBE is available and shipment will be 21 days later than the standard shipment. TSV and RDL modules is available for SG13S and SG13G2 technologies and for runs with low priority, it leads to a 35 days longer cycle time for TSV module. 

2.2.1 BEOL (only)/Interposer/PIC runs

TAPE INSG13 BEOLSG25_PIC_H7IntM4TM2TSV
Feb 9, 26 Aug 20  
Apr 13, 26  Jul 01 
Jun 15, 26Oct 26  Dec 02*
Aug 24, 26  Nov 11 

There might be internal runs, without confirmed schedule. Feel free to ask our customer support for more details if you are interested in joining such runs.

2.3 Information on Minimum Area per MPW Run

There is a minimum area requirement of only 0.8 mm² for selected technologies or module in schedule tables in chapter 2.2 and 2.3. This is valid for all technologies or modules marked with bold shipment times. For all technologies or modules marked with grey italic shipment times in brackets, minimum area order as given in the following table is required. A registration 4 weeks before TAPE out, followed by the confirmation from the foundry, is necessary in this case. By default these additional runs are without priority. A combination of 0.25 μm based runs and 0.13 μm based runs is not possible.

ProcessMin Area [mm²]Min Area1 for Discount
SG25H7_EPIC10-
SGB25RH25-
SG13S1010
SG13CMOS--
SG13G21010
SG13G310-
SG13SCu1010
SG13G2Cu1010
SG13G3Cu1010
SG25_H7PIC1212

1 Ask for special price if you need more than this area for one MPW run.

Delivery

As default 40 diced samples will be delivered. Exceptions are designs using TSV module and SG25_H7PIC. Here 25 samples will be delivered by default. The delivery includes E-test data and RF measurements.

Back lapping options:

  • 200 µm (no additional fee)
  • 300 µm (no additional fee)
  • 250 µm (additional fee)
  • 150 µm (additional fee)
  • 100 µm (additional fee)
  • 75 µm (for TSV module only)

Research Engineering Runs

IHP is offering complete mask sets only for research purpose and prototyping. If customer specific modules are added to a qualified technology, this technology is considered as non-qualified with status “early access”. Prices for Research Engineering Runs can be given upon request.

IHP's General Terms and Conditions »

For further information please contact:

Dr. René Scholz

IHP GmbH 
Im Technologiepark 25 
15236 Frankfurt (Oder) 
Germany 

Phone: +49 335 5625 647
Fax: +49 335 5625 327
Send e-mail »

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